Ultrahigh- Q nanocavities written with a nanoprobe

Atsushi Yokoo, Takasumi Tanabe, Eiichi Kuramochi, Masaya Notomi

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>106) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.

Original languageEnglish
Pages (from-to)3634-3642
Number of pages9
JournalNano Letters
Volume11
Issue number9
DOIs
Publication statusPublished - 2011 Sep 14
Externally publishedYes

Fingerprint

Nanoprobes
Photonic crystals
photonics
Integrated circuits
Defects
Photonic devices
integrated circuits
Silicon
Photonics
Lithography
crystals
Demonstrations
cavities
Scanning
defects
Networks (circuits)
Substrates
Q factors
lithography
scanning

Keywords

  • microcavity
  • Nanophotonics
  • photonic crystal cavities
  • photonic integrated circuits
  • scanning probe lithography
  • Si photonics

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanical Engineering

Cite this

Ultrahigh- Q nanocavities written with a nanoprobe. / Yokoo, Atsushi; Tanabe, Takasumi; Kuramochi, Eiichi; Notomi, Masaya.

In: Nano Letters, Vol. 11, No. 9, 14.09.2011, p. 3634-3642.

Research output: Contribution to journalArticle

Yokoo, A, Tanabe, T, Kuramochi, E & Notomi, M 2011, 'Ultrahigh- Q nanocavities written with a nanoprobe', Nano Letters, vol. 11, no. 9, pp. 3634-3642. https://doi.org/10.1021/nl201449m
Yokoo, Atsushi ; Tanabe, Takasumi ; Kuramochi, Eiichi ; Notomi, Masaya. / Ultrahigh- Q nanocavities written with a nanoprobe. In: Nano Letters. 2011 ; Vol. 11, No. 9. pp. 3634-3642.
@article{8d9fefdf9fdf4739a2e1729a8c05a6c3,
title = "Ultrahigh- Q nanocavities written with a nanoprobe",
abstract = "High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>106) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.",
keywords = "microcavity, Nanophotonics, photonic crystal cavities, photonic integrated circuits, scanning probe lithography, Si photonics",
author = "Atsushi Yokoo and Takasumi Tanabe and Eiichi Kuramochi and Masaya Notomi",
year = "2011",
month = "9",
day = "14",
doi = "10.1021/nl201449m",
language = "English",
volume = "11",
pages = "3634--3642",
journal = "Nano Letters",
issn = "1530-6984",
publisher = "American Chemical Society",
number = "9",

}

TY - JOUR

T1 - Ultrahigh- Q nanocavities written with a nanoprobe

AU - Yokoo, Atsushi

AU - Tanabe, Takasumi

AU - Kuramochi, Eiichi

AU - Notomi, Masaya

PY - 2011/9/14

Y1 - 2011/9/14

N2 - High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>106) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.

AB - High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>106) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.

KW - microcavity

KW - Nanophotonics

KW - photonic crystal cavities

KW - photonic integrated circuits

KW - scanning probe lithography

KW - Si photonics

UR - http://www.scopus.com/inward/record.url?scp=80052796310&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80052796310&partnerID=8YFLogxK

U2 - 10.1021/nl201449m

DO - 10.1021/nl201449m

M3 - Article

VL - 11

SP - 3634

EP - 3642

JO - Nano Letters

JF - Nano Letters

SN - 1530-6984

IS - 9

ER -