Ultrahigh- Q nanocavities written with a nanoprobe

Atsushi Yokoo, Takasumi Tanabe, Eiichi Kuramochi, Masaya Notomi

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

High-Q nanocavities have been extensively studied recently because they are considered key elements in low-power photonic devices and integrated circuits. Here we demonstrate that ultrahigh-Q (>106) nanocavities can be created by employing scanning probe lithography on a prepatterned line defect in a silicon photonic crystal. This is the first realization of ultrahigh-Q nanocavities by the postprocess modification of photonic crystals. With this method, we can form an ultrahigh-Q nanocavity with controllable cavity parameters at an arbitrary position along a line defect. Furthermore, the fabricated nanocavity achieves ultralow power all-optical bistable operation owing to its large cavity enhancement effect. This demonstration indicates the possibility of realizing photonic integrated circuits on demand, where various circuit patterns are written with a nanoprobe on a universal photonic crystal substrate.

Original languageEnglish
Pages (from-to)3634-3642
Number of pages9
JournalNano Letters
Volume11
Issue number9
DOIs
Publication statusPublished - 2011 Sep 14
Externally publishedYes

Keywords

  • Nanophotonics
  • Si photonics
  • microcavity
  • photonic crystal cavities
  • photonic integrated circuits
  • scanning probe lithography

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanical Engineering

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