Unified roughness scattering model incorporating scattering component induced by thickness fluctuations in silicon-on-insulator metal-oxide- semiconductor field-effect transistors

Takamitsu Ishihara, Ken Uchida, Junji Koga, Shin Ichi Takagi

Research output: Contribution to journalArticlepeer-review

15 Citations (Scopus)

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Physics & Astronomy

Engineering & Materials Science