Unified understanding of Vth and Id variability in tri-gate nanowire MOSFETs

M. Saitoh, K. Ota, C. Tanaka, Y. Nakabayashi, Ken Uchida, T. Numata

Research output: Chapter in Book/Report/Conference proceedingConference contribution

12 Citations (Scopus)

Abstract

We present the systematic study of Vth and Idlin/ Idsat variability of nanowire transistors (NW Tr.) with various parameters (NW width (WNW) and height (HNW) down to 10nm, NW number (NNW), NW directions, channel dopants). By adopting NW circumference as Weff, the universal line appears in Pelgrom plot of both σVth and σId for a wide range of gate length (Lg), WNW and HNW. We found A vt reduction in NW Tr. compared to planar SOI Tr. due to gate grain alignment. Deviation of σVth and σIdlin of the narrowest Tr. from the universal line was eliminated by suppressing the parasitic resistance (RSD). σIdsat and σI dlin in NW Tr. can be reduced by improving the surface-roughness- limited mobility and its variations, respectively.

Original languageEnglish
Title of host publicationDigest of Technical Papers - Symposium on VLSI Technology
Pages132-133
Number of pages2
Publication statusPublished - 2011
Externally publishedYes
Event2011 Symposium on VLSI Technology, VLSIT 2011 - Kyoto, Japan
Duration: 2011 Jun 142011 Jun 16

Other

Other2011 Symposium on VLSI Technology, VLSIT 2011
CountryJapan
CityKyoto
Period11/6/1411/6/16

Fingerprint

Nanowires
Transistors
Surface roughness
Doping (additives)

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Saitoh, M., Ota, K., Tanaka, C., Nakabayashi, Y., Uchida, K., & Numata, T. (2011). Unified understanding of Vth and Id variability in tri-gate nanowire MOSFETs. In Digest of Technical Papers - Symposium on VLSI Technology (pp. 132-133). [5984644]

Unified understanding of Vth and Id variability in tri-gate nanowire MOSFETs. / Saitoh, M.; Ota, K.; Tanaka, C.; Nakabayashi, Y.; Uchida, Ken; Numata, T.

Digest of Technical Papers - Symposium on VLSI Technology. 2011. p. 132-133 5984644.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Saitoh, M, Ota, K, Tanaka, C, Nakabayashi, Y, Uchida, K & Numata, T 2011, Unified understanding of Vth and Id variability in tri-gate nanowire MOSFETs. in Digest of Technical Papers - Symposium on VLSI Technology., 5984644, pp. 132-133, 2011 Symposium on VLSI Technology, VLSIT 2011, Kyoto, Japan, 11/6/14.
Saitoh M, Ota K, Tanaka C, Nakabayashi Y, Uchida K, Numata T. Unified understanding of Vth and Id variability in tri-gate nanowire MOSFETs. In Digest of Technical Papers - Symposium on VLSI Technology. 2011. p. 132-133. 5984644
Saitoh, M. ; Ota, K. ; Tanaka, C. ; Nakabayashi, Y. ; Uchida, Ken ; Numata, T. / Unified understanding of Vth and Id variability in tri-gate nanowire MOSFETs. Digest of Technical Papers - Symposium on VLSI Technology. 2011. pp. 132-133
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