Abstract
This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.
| Original language | English |
|---|---|
| Article number | 263503 |
| Journal | Applied Physics Letters |
| Volume | 111 |
| Issue number | 26 |
| DOIs | |
| Publication status | Published - 2017 Dec 25 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
Cite this
Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array. / Takahashi, Hidetoshi; Shimoyama, I.; Heo, Y. J.
In: Applied Physics Letters, Vol. 111, No. 26, 263503, 25.12.2017.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array
AU - Takahashi, Hidetoshi
AU - Shimoyama, I.
AU - Heo, Y. J.
PY - 2017/12/25
Y1 - 2017/12/25
N2 - This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.
AB - This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.
UR - http://www.scopus.com/inward/record.url?scp=85040108379&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85040108379&partnerID=8YFLogxK
U2 - 10.1063/1.5001025
DO - 10.1063/1.5001025
M3 - Article
AN - SCOPUS:85040108379
VL - 111
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 26
M1 - 263503
ER -