Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array

Hidetoshi Takahashi, I. Shimoyama, Y. J. Heo

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.

Original languageEnglish
Article number263503
JournalApplied Physics Letters
Volume111
Issue number26
DOIs
Publication statusPublished - 2017 Dec 25
Externally publishedYes

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waveforms
light emitting diodes
lithography
actuators
fabrication
pulse duration modulation
luminous intensity
light sources
microstructure

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array. / Takahashi, Hidetoshi; Shimoyama, I.; Heo, Y. J.

In: Applied Physics Letters, Vol. 111, No. 26, 263503, 25.12.2017.

Research output: Contribution to journalArticle

@article{789b1492eee347bdb523cdb3284d41d7,
title = "Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array",
abstract = "This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.",
author = "Hidetoshi Takahashi and I. Shimoyama and Heo, {Y. J.}",
year = "2017",
month = "12",
day = "25",
doi = "10.1063/1.5001025",
language = "English",
volume = "111",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "26",

}

TY - JOUR

T1 - Uniform areal-distribution of UV intensity by synchronizing signal-waveforms and position of a UV-LED array

AU - Takahashi, Hidetoshi

AU - Shimoyama, I.

AU - Heo, Y. J.

PY - 2017/12/25

Y1 - 2017/12/25

N2 - This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.

AB - This paper describes a theoretical approach to give an irradiated area a uniform distribution of LED light intensity by synchronizing the signal waveforms and position control of the LEDs. Although UV-LEDs have attracted considerable attention as alternative light sources for ultraviolet (UV) lithography in Micro Electro Mechanical Systems (MEMS) fabrication, mainly because of their low cost and low power consumption, the realization of a uniform UV intensity over an area remains challenging. Here, we propose a method to achieve a uniform areal intensity within an irradiated area by synchronizing the signal waveform and position of a UV-LED array. To verify our theoretical calculation, we developed a system with a UV-LED array whose position is controlled by a linear actuator. The intensity of the UV-LED array is controlled by a pulse width modulation (PWM) signal, which is synchronized with the position of the linear actuator. Using this system, we fabricated 2D micropatterns and 3D microstructures with high uniformity in the irradiated area. The proposed method is expected to facilitate practical LED-based lithography in MEMS fabrication.

UR - http://www.scopus.com/inward/record.url?scp=85040108379&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85040108379&partnerID=8YFLogxK

U2 - 10.1063/1.5001025

DO - 10.1063/1.5001025

M3 - Article

AN - SCOPUS:85040108379

VL - 111

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 26

M1 - 263503

ER -