Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip

Jim Taniguchi; Iwao Miyamoto; Naoto Ohno; Satoshi Honda

doi:10.1016/S0168-583X(96)00449-1

Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip

Jim Taniguchi, Iwao Miyamoto, Naoto Ohno, Satoshi Honda

Department of Applied Physics and Physico-Informatics

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Electron beam assisted chemical etching (EBACE) with oxygen gas is not applicable for direct fine patterning of diamond devices, because the diamond is an electrical insulator and electron beam impingement of the diamond causes the surface charge-up. It is possible to form conductive layer of hydrocarbon on the diamond surface by electron beam irradiation in the atmosphere of diffusion pump oil vapors. In this paper, a scanning electron microscope (SEM) combined with oxygen gas introduction system was used for EBACE of the diamond. It was found by in-situ SEM observation that rectangular patterns with several μm² area and sub-μm depth were formed on the diamond chip.

Original language	English
Pages (from-to)	507-509
Number of pages	3
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	121
Issue number	1-4
DOIs	https://doi.org/10.1016/S0168-583X(96)00449-1
Publication status	Published - 1997 Jan

ASJC Scopus subject areas

Nuclear and High Energy Physics
Instrumentation

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10.1016/S0168-583X(96)00449-1

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Taniguchi, J., Miyamoto, I., Ohno, N., & Honda, S. (1997). Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 121(1-4), 507-509. https://doi.org/10.1016/S0168-583X(96)00449-1

Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip. / Taniguchi, Jim; Miyamoto, Iwao; Ohno, Naoto et al.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 121, No. 1-4, 01.1997, p. 507-509.

Research output: Contribution to journal › Article › peer-review

Taniguchi, J, Miyamoto, I, Ohno, N & Honda, S 1997, 'Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip', Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, vol. 121, no. 1-4, pp. 507-509. https://doi.org/10.1016/S0168-583X(96)00449-1

@article{4ee5b5f9cf6d48d9ace00067cd37cbdd,

title = "Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip",

abstract = "Electron beam assisted chemical etching (EBACE) with oxygen gas is not applicable for direct fine patterning of diamond devices, because the diamond is an electrical insulator and electron beam impingement of the diamond causes the surface charge-up. It is possible to form conductive layer of hydrocarbon on the diamond surface by electron beam irradiation in the atmosphere of diffusion pump oil vapors. In this paper, a scanning electron microscope (SEM) combined with oxygen gas introduction system was used for EBACE of the diamond. It was found by in-situ SEM observation that rectangular patterns with several μm2 area and sub-μm depth were formed on the diamond chip.",

author = "Jim Taniguchi and Iwao Miyamoto and Naoto Ohno and Satoshi Honda",

year = "1997",

month = jan,

doi = "10.1016/S0168-583X(96)00449-1",

language = "English",

volume = "121",

pages = "507--509",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier",

number = "1-4",

}

TY - JOUR

T1 - Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip

AU - Taniguchi, Jim

AU - Miyamoto, Iwao

AU - Ohno, Naoto

AU - Honda, Satoshi

PY - 1997/1

Y1 - 1997/1

N2 - Electron beam assisted chemical etching (EBACE) with oxygen gas is not applicable for direct fine patterning of diamond devices, because the diamond is an electrical insulator and electron beam impingement of the diamond causes the surface charge-up. It is possible to form conductive layer of hydrocarbon on the diamond surface by electron beam irradiation in the atmosphere of diffusion pump oil vapors. In this paper, a scanning electron microscope (SEM) combined with oxygen gas introduction system was used for EBACE of the diamond. It was found by in-situ SEM observation that rectangular patterns with several μm2 area and sub-μm depth were formed on the diamond chip.

AB - Electron beam assisted chemical etching (EBACE) with oxygen gas is not applicable for direct fine patterning of diamond devices, because the diamond is an electrical insulator and electron beam impingement of the diamond causes the surface charge-up. It is possible to form conductive layer of hydrocarbon on the diamond surface by electron beam irradiation in the atmosphere of diffusion pump oil vapors. In this paper, a scanning electron microscope (SEM) combined with oxygen gas introduction system was used for EBACE of the diamond. It was found by in-situ SEM observation that rectangular patterns with several μm2 area and sub-μm depth were formed on the diamond chip.

UR - http://www.scopus.com/inward/record.url?scp=0031546188&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031546188&partnerID=8YFLogxK

U2 - 10.1016/S0168-583X(96)00449-1

DO - 10.1016/S0168-583X(96)00449-1

M3 - Article

AN - SCOPUS:0031546188

SN - 0168-583X

VL - 121

SP - 507

EP - 509

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

IS - 1-4

ER -

Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip

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