Utilizing of hydrocarbon contamination for prevention of the surface charge-up at electron-beam assisted chemical etching of a diamond chip

Jim Taniguchi, Iwao Miyamoto, Naoto Ohno, Satoshi Honda

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

Electron beam assisted chemical etching (EBACE) with oxygen gas is not applicable for direct fine patterning of diamond devices, because the diamond is an electrical insulator and electron beam impingement of the diamond causes the surface charge-up. It is possible to form conductive layer of hydrocarbon on the diamond surface by electron beam irradiation in the atmosphere of diffusion pump oil vapors. In this paper, a scanning electron microscope (SEM) combined with oxygen gas introduction system was used for EBACE of the diamond. It was found by in-situ SEM observation that rectangular patterns with several μm2 area and sub-μm depth were formed on the diamond chip.

Original languageEnglish
Pages (from-to)507-509
Number of pages3
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume121
Issue number1-4
DOIs
Publication statusPublished - 1997 Jan

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation

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