UV-Induced formation of [Fe(bpy)3]2+ complex and its confinement into silica fine particles

Chikashi Nakanishi; Saori Ikeda; Tetsuhiko Isobe; Mamoru Senna

doi:10.1023/A:1020749604691

UV-Induced formation of [Fe(bpy)₃]²⁺ complex and its confinement into silica fine particles

Chikashi Nakanishi, Saori Ikeda, Tetsuhiko Isobe, Mamoru Senna

Department of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Silica fine particles in a single or sub-micrometer regime, containing FeCl₃ and 2,2′-bipyridine (bpy), were prepared by utilizing reverse micellar method. Formation of tris-bpy iron(II) ([Fe(bpy)³]²⁺) complex was induced in the silica fine particles by UV irradiation at 365 nm. The starting micellar solution was obtained by an injection of 0.04 cm³ HCl aqueous solution into 5 cm³ tetraethyl orthosilicate (TEOS)/cyclohexane (2 cm³/3 cm³) mixed solution containing 4-14 vol% of nonionic surfactant, polyoxyethylene(5) nonylphenyl ether (NP-5). Size of the silica particles was regulated by the concentration of NP-5.

Original language	English
Pages (from-to)	103-106
Number of pages	4
Journal	Journal of Sol-Gel Science and Technology
Volume	26
Issue number	1-3
DOIs	https://doi.org/10.1023/A:1020749604691
Publication status	Published - 2003 Jan 1

Keywords

Complex formation
Photo-sensitivity
Reverse micelle method
Silica fine particles

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Biomaterials
Condensed Matter Physics
Materials Chemistry

Access to Document

10.1023/A:1020749604691

Cite this

@article{f34e158cb5104e59a5ca892dc2ba587c,

title = "UV-Induced formation of [Fe(bpy)3]2+ complex and its confinement into silica fine particles",

abstract = "Silica fine particles in a single or sub-micrometer regime, containing FeCl3 and 2,2′-bipyridine (bpy), were prepared by utilizing reverse micellar method. Formation of tris-bpy iron(II) ([Fe(bpy)3]2+) complex was induced in the silica fine particles by UV irradiation at 365 nm. The starting micellar solution was obtained by an injection of 0.04 cm3 HCl aqueous solution into 5 cm3 tetraethyl orthosilicate (TEOS)/cyclohexane (2 cm3/3 cm3) mixed solution containing 4-14 vol% of nonionic surfactant, polyoxyethylene(5) nonylphenyl ether (NP-5). Size of the silica particles was regulated by the concentration of NP-5.",

keywords = "Complex formation, Photo-sensitivity, Reverse micelle method, Silica fine particles",

author = "Chikashi Nakanishi and Saori Ikeda and Tetsuhiko Isobe and Mamoru Senna",

year = "2003",

month = jan,

day = "1",

doi = "10.1023/A:1020749604691",

language = "English",

volume = "26",

pages = "103--106",

journal = "Journal of Sol-Gel Science and Technology",

issn = "0928-0707",

publisher = "Springer Netherlands",

number = "1-3",

}

TY - JOUR

T1 - UV-Induced formation of [Fe(bpy)3]2+ complex and its confinement into silica fine particles

AU - Nakanishi, Chikashi

AU - Ikeda, Saori

AU - Isobe, Tetsuhiko

AU - Senna, Mamoru

PY - 2003/1/1

Y1 - 2003/1/1

N2 - Silica fine particles in a single or sub-micrometer regime, containing FeCl3 and 2,2′-bipyridine (bpy), were prepared by utilizing reverse micellar method. Formation of tris-bpy iron(II) ([Fe(bpy)3]2+) complex was induced in the silica fine particles by UV irradiation at 365 nm. The starting micellar solution was obtained by an injection of 0.04 cm3 HCl aqueous solution into 5 cm3 tetraethyl orthosilicate (TEOS)/cyclohexane (2 cm3/3 cm3) mixed solution containing 4-14 vol% of nonionic surfactant, polyoxyethylene(5) nonylphenyl ether (NP-5). Size of the silica particles was regulated by the concentration of NP-5.

AB - Silica fine particles in a single or sub-micrometer regime, containing FeCl3 and 2,2′-bipyridine (bpy), were prepared by utilizing reverse micellar method. Formation of tris-bpy iron(II) ([Fe(bpy)3]2+) complex was induced in the silica fine particles by UV irradiation at 365 nm. The starting micellar solution was obtained by an injection of 0.04 cm3 HCl aqueous solution into 5 cm3 tetraethyl orthosilicate (TEOS)/cyclohexane (2 cm3/3 cm3) mixed solution containing 4-14 vol% of nonionic surfactant, polyoxyethylene(5) nonylphenyl ether (NP-5). Size of the silica particles was regulated by the concentration of NP-5.

KW - Complex formation

KW - Photo-sensitivity

KW - Reverse micelle method

KW - Silica fine particles

UR - http://www.scopus.com/inward/record.url?scp=0037268908&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037268908&partnerID=8YFLogxK

U2 - 10.1023/A:1020749604691

DO - 10.1023/A:1020749604691

M3 - Article

AN - SCOPUS:0037268908

VL - 26

SP - 103

EP - 106

JO - Journal of Sol-Gel Science and Technology

JF - Journal of Sol-Gel Science and Technology

SN - 0928-0707

IS - 1-3

ER -