Vapor pressure measurements of 1,1,1,2,3,3-hexafluoropropane from 300 to 410 K

Heng Liang Zhang, Haruki Sato, Koichi Watanabe

Research output: Contribution to journalArticle

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Abstract

We present new vapor pressure measurements for 1,1,1,2,3,3-hexafluoropropane (R-236ea) in the temperature range from 300 to 410 K. The measurements were performed with a static technique, and the uncertainties of the measurements were estimated to be within ±0.6 kPa for pressure and within ±8 mK for temperature. A Wagner-type vapor pressure correlation was developed to represent the measured vapor pressures, and the critical pressure was determined as (3411.6 ± 3.0) kPa corresponding to the critical temperature of 412.375 K. The purity of the R-236ea sample used in the present measurements was 99.9 mol %. The effect of the volatile impurity in the sample on the vapor pressure measurements is discussed and corrected.

Original languageEnglish
Pages (from-to)1281-1284
Number of pages4
JournalJournal of Chemical & Engineering Data
Volume40
Issue number6
Publication statusPublished - 1995

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Pressure measurement
Vapor pressure
Temperature
Impurities

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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Vapor pressure measurements of 1,1,1,2,3,3-hexafluoropropane from 300 to 410 K. / Zhang, Heng Liang; Sato, Haruki; Watanabe, Koichi.

In: Journal of Chemical & Engineering Data, Vol. 40, No. 6, 1995, p. 1281-1284.

Research output: Contribution to journalArticle

Zhang, Heng Liang ; Sato, Haruki ; Watanabe, Koichi. / Vapor pressure measurements of 1,1,1,2,3,3-hexafluoropropane from 300 to 410 K. In: Journal of Chemical & Engineering Data. 1995 ; Vol. 40, No. 6. pp. 1281-1284.
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