Vapor Pressure Measurements of 1,1,1,2,3,3-Hexafluoropropane from 300 to 410 K

Heng Liang Zhang, Haruki Sato, Koichi Watanabe

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7 Citations (Scopus)

Abstract

We present new vapor pressure measurements for 1,1,1,2,3,3-hexafluoropropane (R-236ea) in the temperature range from 300 to 410 K. The measurements were performed with a static technique, and the uncertainties of the measurements were estimated to be within ±0.6 kPa for pressure and within ±8 mK for temperature. A Wagner-type vapor pressure correlation was developed to represent the measured vapor pressures, and the critical pressure was determined as (3411.6 ± 3.0) kPa corresponding to the critical temperature of 412.375 K. The purity of the R-236ea sample used in the present measurements was 99.9 mol %. The effect of the volatile impurity in the sample on the vapor pressure measurements is discussed and corrected.

Original languageEnglish
Pages (from-to)1281-1284
Number of pages4
JournalJournal of Chemical and Engineering Data
Volume40
Issue number6
DOIs
Publication statusPublished - 1995 Nov 1

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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