Vertically integrated computer-aided design for device processing

Physics & Astronomy

• computer aided design 100%
• etching 32%
• cold plasmas 31%
• systems integration 20%
• linkages 16%
• plasma etching 15%
• engineers 14%
• integrated circuits 13%
• charging 13%
• modules 11%
• reactors 10%
• boundary conditions 10%
• damage 10%
• profiles 7%
• predictions 7%

Engineering & Materials Science

• Computer aided design 70%
• Etching 45%
• Plasmas 26%
• Plasma applications 22%
• Plasma etching 21%
• Integrated circuits 13%
• Numerical models 11%
• Temperature 11%
• Boundary conditions 10%
• Engineers 9%

Chemical Compounds

• Etching 76%
• Plasma 52%