Visible photoluminescence from evaporated SiOx thin films

Takeru Okada, Eiji Ohta

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

SiOx thin films were prepared by thermal evaporation of SiO powder in vacuum onto Si substrates. The as-deposited samples exhibited blue emission under UV irradiation. Post-annealing was carried out in vacuum, and the photoluminescence (PL) spectra were redshifted from the visible to near-infrared range as the annealing temperature increases. It was also found that the main PL peak wavelength was affected by the deposition rate. The PL spectra of the films consisted of a red and a blue PL. Annealing treatments in oxygen atmosphere were also carried out to investigate the effect of oxidation. From the analysis of the results of infrared spectrometry, we attributed the blue emission to oxygen vacancies in SiOx. And the red PL could be explained by the quantum confinement effect in Si clusters embedded in the SiOx matrix.

Original languageEnglish
Pages (from-to)6413-6416
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume41
Issue number11
Publication statusPublished - 2002 Nov

Fingerprint

Photoluminescence
photoluminescence
Thin films
thin films
Annealing
annealing
Vacuum
Infrared radiation
vacuum
Quantum confinement
Thermal evaporation
oxygen
Oxygen vacancies
Deposition rates
Spectrometry
evaporation
Irradiation
Powders
atmospheres
Wavelength

Keywords

  • Infrared spectrometry
  • Photoluminescence
  • Quantum confinement
  • SiO
  • Thermal evaporation
  • Thin film

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Visible photoluminescence from evaporated SiOx thin films. / Okada, Takeru; Ohta, Eiji.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 41, No. 11, 11.2002, p. 6413-6416.

Research output: Contribution to journalArticle

@article{c57f2c59140d4308a58e1e9c83ed9c44,
title = "Visible photoluminescence from evaporated SiOx thin films",
abstract = "SiOx thin films were prepared by thermal evaporation of SiO powder in vacuum onto Si substrates. The as-deposited samples exhibited blue emission under UV irradiation. Post-annealing was carried out in vacuum, and the photoluminescence (PL) spectra were redshifted from the visible to near-infrared range as the annealing temperature increases. It was also found that the main PL peak wavelength was affected by the deposition rate. The PL spectra of the films consisted of a red and a blue PL. Annealing treatments in oxygen atmosphere were also carried out to investigate the effect of oxidation. From the analysis of the results of infrared spectrometry, we attributed the blue emission to oxygen vacancies in SiOx. And the red PL could be explained by the quantum confinement effect in Si clusters embedded in the SiOx matrix.",
keywords = "Infrared spectrometry, Photoluminescence, Quantum confinement, SiO, Thermal evaporation, Thin film",
author = "Takeru Okada and Eiji Ohta",
year = "2002",
month = "11",
language = "English",
volume = "41",
pages = "6413--6416",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11",

}

TY - JOUR

T1 - Visible photoluminescence from evaporated SiOx thin films

AU - Okada, Takeru

AU - Ohta, Eiji

PY - 2002/11

Y1 - 2002/11

N2 - SiOx thin films were prepared by thermal evaporation of SiO powder in vacuum onto Si substrates. The as-deposited samples exhibited blue emission under UV irradiation. Post-annealing was carried out in vacuum, and the photoluminescence (PL) spectra were redshifted from the visible to near-infrared range as the annealing temperature increases. It was also found that the main PL peak wavelength was affected by the deposition rate. The PL spectra of the films consisted of a red and a blue PL. Annealing treatments in oxygen atmosphere were also carried out to investigate the effect of oxidation. From the analysis of the results of infrared spectrometry, we attributed the blue emission to oxygen vacancies in SiOx. And the red PL could be explained by the quantum confinement effect in Si clusters embedded in the SiOx matrix.

AB - SiOx thin films were prepared by thermal evaporation of SiO powder in vacuum onto Si substrates. The as-deposited samples exhibited blue emission under UV irradiation. Post-annealing was carried out in vacuum, and the photoluminescence (PL) spectra were redshifted from the visible to near-infrared range as the annealing temperature increases. It was also found that the main PL peak wavelength was affected by the deposition rate. The PL spectra of the films consisted of a red and a blue PL. Annealing treatments in oxygen atmosphere were also carried out to investigate the effect of oxidation. From the analysis of the results of infrared spectrometry, we attributed the blue emission to oxygen vacancies in SiOx. And the red PL could be explained by the quantum confinement effect in Si clusters embedded in the SiOx matrix.

KW - Infrared spectrometry

KW - Photoluminescence

KW - Quantum confinement

KW - SiO

KW - Thermal evaporation

KW - Thin film

UR - http://www.scopus.com/inward/record.url?scp=0036873142&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036873142&partnerID=8YFLogxK

M3 - Article

VL - 41

SP - 6413

EP - 6416

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11

ER -