A model of amorphous silicon deposition in DC glow discharge in silane

Yukio Yamaguchi, Akihiko Sumiyama, Ryu Ichi Hattori, Yukihiko Morokuma, Toshiaki Makabe

研究成果: Article査読

11 被引用数 (Scopus)

抄録

The structure of the cylindrical DC glow discharge in SiH4 is presented by solving a basic set of equations, consisting of the electron, ion, gas molecule and radical continuity equations, and Poisson's equation. The electron swarm parameters are then obtained up to an E/N of 6*10-14 V cm2 from the analysis of the Boltzmann equation using the available cross-sectional information, and considering the local non-equilibrium at the cathode fall region. The spatial distribution of the radical is shown to have a maximum of 1012 cm-3 at the boundary between the sheath and plasma bulk. The production rate profile is also studied. The deposition rate of the radicals to the inner electrode is calculated from the diffusion flux of the radical molecule in space. The evaluated deposition rate of a-Si:H in the DC discharge in SiH4 is consistent with previous experimental results within a factor of 0.5. The role of the negative ion and the influence of the non-equilibrium region in front of the cathode are also discussed.

本文言語English
ページ(範囲)505-511
ページ数7
ジャーナルJournal of Physics D: Applied Physics
22
4
DOI
出版ステータスPublished - 1989 4 14

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 音響学および超音波学
  • 表面、皮膜および薄膜

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