A numerical investigation of atomic oxygen density in an inductively coupled plasma in O2/Ar mixture

Toshikazu Sato, Toshiaki Makabe

研究成果: Article査読

23 被引用数 (Scopus)

抄録

A numerical simulation of an inductively coupled plasma in an O 2(<10%)/Ar mixture has been performed to investigate the production mechanisms and the spatial distribution of the atomic oxygen density. The O(3P) density is four times larger than that of O(1D) and much larger than the metastable molecular oxygen O(a1Δ g) density at 100 mTorr. The dominant mechanism of O(3P) production is electron quenching of O(1D) produced by dissociative excitation by electrons, and the net dissociation rate of O2 is one order of magnitude smaller than that of electron quenching of O(1D). However, quenching of O(1D) and excitation of O(3P) are found to be competitive processes under the present conditions. Both electron and Ar metastable (Ar*) density have the maxima at an O 2 fraction of 1%, though Ar* has little effect on the production of O(3P) and O(1D) under the present high density plasma where Ar* is quenched by high density electrons and consumed.

本文言語English
論文番号035211
ジャーナルJournal of Physics D: Applied Physics
41
3
DOI
出版ステータスPublished - 2008 2月 7

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 音響学および超音波学
  • 表面、皮膜および薄膜

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