A Study of Gray Scale Lithography with Micro Chrome Pattern

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Gray scale lithography has been recently researched to make 3D structures such as a microlens, prism etc. In this research, a novel gray scale mask was fabricated by chrome mask and EB lithography system that can apply bitmap data (tiff form file) to drawing data. The gray scale was realized using half-tone pattern which consists of array of micro spots (diameters are 0.2μm - 1.6μm). Thick positive UV resist (AZ-p4620) on Si was exposed, defocusing the half-tone pattern by holding the gap of 80μm. Relation between gray scale value and depth was examined, and Fresnel lens pattern was formed on the resist.

本文言語English
ページ(範囲)410-415
ページ数6
ジャーナルieej transactions on sensors and micromachines
123
10
DOI
出版ステータスPublished - 2003

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering

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