Adsorption of hydrogen on Al(111) and Al(110): coverage and temperature dependence of adsorption states

H. Kondoh, M. Hara, K. Domen, H. Nozoye

研究成果: Article査読

22 被引用数 (Scopus)

抄録

Although hydrogen adsorbed on aluminum surfaces is a simple-looking adsorption system, the interaction between them has been found to be very peculiar; that is, a large amount of aluminum hydride molecules such as Al2H6 and/or AlH3 desorb from H/Al(111), while they desorb hardly from H/Al(110). In order to investigate the adsorption states of hydrogen on the two different aluminum surfaces, we have studied these systems by TPD, LEED, and HREELS. Hydrogen atoms adsorb in the island-growth manner on Al(111) at 85 K from the initial stage of adsorption and form a surface aluminum hydride after annealing the surface. The hydrogen adsorption on Al(110) at 85 K exhibits sequential site filling in contrast to H/Al(111) and displays a (1 × 2) reconstruction after annealing.

本文言語English
ページ(範囲)74-78
ページ数5
ジャーナルSurface Science
287-288
PART 1
DOI
出版ステータスPublished - 1993 5 10
外部発表はい

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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