Analysis of the H- ion emissive surface in the extraction region of negative ion sources

N. Kameyama, T. Fukuyama, S. Wada, S. Kuppel, K. Tsumori, H. Nakano, A. Hatayama, K. Miyamoto, A. Fukano, M. Bacal

研究成果: Article査読

11 被引用数 (Scopus)

抄録

To understand the plasma characteristics in the extraction region of negative H- sources is very important for the optimization of H - extraction from the sources. The profile of plasma density and electrostatic potential in the extraction region with and without extraction grid voltage are analyzed with a 2D particle in cell modeling of the NIFS-RD H- sources. The simulation results make clear the physical process forming a double ion plasma layer (which consists only of positive H+ and negative H- ions) recently observed in the Cs-seeded experiments of the NIFS-RD source in the vicinity of the extraction hole and the plasma grid. The results also give a useful insight into the formation mechanism of the plasma meniscus and the H- extraction process for such double ion plasma.

本文言語English
論文番号02A721
ジャーナルReview of Scientific Instruments
83
2
DOI
出版ステータスPublished - 2012 2月
外部発表はい

ASJC Scopus subject areas

  • 器械工学

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