Anomalous Hall effect at a PtOx/Co interface

Hiroki Hayashi, Akio Asami, Kazuya Ando

研究成果: Article査読

3 被引用数 (Scopus)

抄録

We study the anomalous Hall effect at a PtOx/Co interface. We extracted the intrinsic and extrinsic contributions to the anomalous Hall effect in SiO2/Co/SiO2 and PtOx/Co/SiO2 films by measuring temperature dependence of the anomalous Hall resistivity. The result shows that the intrinsic anomalous Hall effect in the PtOx/Co/SiO2 film is almost identical to that in the SiO2/Co/SiO2 film. In contrast, the extrinsic anomalous Hall effect is clearly different between the SiO2/Co/SiO2 and PtOx/Co/SiO2 films. The anomalous Hall effect for various Co-layer thicknesses t at various temperatures reveals that the extrinsic anomalous Hall resistivity shows a t-1 dependence in the PtOx/Co/SiO2 film, while it is almost independent of t in the SiO2/Co/SiO2 film. This result demonstrates the extrinsic anomalous Hall effect originating from the PtOx/Co interface. Our results show that both the side-jump and skew-scattering mechanisms contribute to the interfacial anomalous Hall effect, which can be attributed to the formation of Co-O bonds and electron scattering by Pt impurities at the PtOx/Co interface.

本文言語English
論文番号214415
ジャーナルPhysical Review B
100
21
DOI
出版ステータスPublished - 2019 12 16

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

フィンガープリント

「Anomalous Hall effect at a PtOx/Co interface」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル