Argon metastable state densities in inductively coupled plasma in mixtures of Ar and O2

Y. Hayashi, S. Hirao, Y. Zhang, T. Gans, D. O'Connell, Z. Lj Petrović, T. Makabe

研究成果: Article査読

27 被引用数 (Scopus)

抄録

We have measured the densities of 1s5 and 1s3 argon metastables as a function of the abundance of molecular oxygen in an inductively coupled plasma (ICP) in mixtures of Ar and O2. Laser absorption spectroscopy was used to determine the densities of the metastables. It was found that even small abundances of oxygen lead to large increases in metastable density, mostly due to the reduction in the electron number density, since electron-induced quenching determines the metastable density. At abundances higher than 7% to 15% for powers between 50 and 150 W, quenching by oxygen molecules begins to dominate and the metastable density drops again.

本文言語English
論文番号145206
ジャーナルJournal of Physics D: Applied Physics
42
14
DOI
出版ステータスPublished - 2009

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • 音響学および超音波学
  • 表面、皮膜および薄膜

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