Comparison of Micro Chrome Patterns in Gray Scale Lithography

研究成果: Conference article査読

7 被引用数 (Scopus)


Gray scale lithography is an attracting technology to fabricate 3D structures such as a microlens, prism etc. In this study, a gray scale chrome mask was fabricated by using image-processing software and E-beam lithography system that can use bitmap as drawing data. Random dither pattern and half-tone pattern by circles were generated as a fundamental micro pattern. UV exposure was performed on 10μm thick positive resist (AZ-p4620). The mask was distanced 80μm from the resist surface to defocus the micro pattern. As a result, half-tone pattern provides smooth surface while the surface condition of dither pattern had a horizontally large roughness. The resist depth was changed in the range of 20%-80% gray-scale value for the dither pattern, and in the little wider range of 20%-90% for the half-tone pattern. Then, Fresnel lens profile was formed by using half-tone pattern, which profile was calculated by C-code program and polar-coordinates conversion by image-processing software.

ジャーナルProceedings of SPIE - The International Society for Optical Engineering
出版ステータスPublished - 2004 5 10
イベントMicromachining and Microfabrication Process Technology IX - San Jose, CA., United States
継続期間: 2004 1 272004 1 29

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学


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