Compensation method of offset and its temperature drift in silicon piezoresistive pressure sensor using double wheatstone-bridge configuration

Young Tae Lee, Hee Don Seo, Akihisa Kawamura, Tetsuhiro Yamada, Yoshinori Matsumoto, Makoto Ishida, Tetsuro Nakamura

研究成果: Paper査読

16 被引用数 (Scopus)

抄録

In order to reduce the offset and its temperature drift of the piezoresistive pressure sensor by the different properties of the piezoresistors and the residual stress, a double Wheatstone-bridge pressure sensor was studied. Because a compensation bridge was arranged near by the pressure sensitive bridge, which have the similar offset components, reduction of the offset and its temperature drift was realized by the subtraction of the output of the two bridges. By this compensation method, the offset and its temperature drift were reduced more than 95%, respectively. The sensitivity of the fabricated pressure sensor was 11.7 mV/V kgf cm-2 for 0.9 kgf cm-2 full-scale pressure range.

本文言語English
ページ570-573
ページ数4
出版ステータスPublished - 1995
外部発表はい
イベントProceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2) - Stockholm, Sweden
継続期間: 1995 6 251995 6 29

Other

OtherProceedings of the 1995 8th International Conference on Solid-State Sensors and Actuators and Eurosensors IX. Part 1 (of 2)
CityStockholm, Sweden
Period95/6/2595/6/29

ASJC Scopus subject areas

  • Engineering(all)

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