Control of optical bandgap energy and optical absorption coefficient by geometric parameters in sub-10nm silicon-nanodisc array structure

Mohd Fairuz Budiman, Weiguo Hu, Makoto Igarashi, Rikako Tsukamoto, Taiga Isoda, Kohei M. Itoh, Ichiro Yamashita, Akihiro Murayama, Yoshitaka Okada, Seiji Samukawa

研究成果: Article

33 引用 (Scopus)

抜粋

A sub-10nm, high-density, periodic silicon-nanodisc (Si-ND) array has been fabricated using a new top-down process, which involves a 2D array bio-template etching mask made of Listeria-Dps with a 4.5nm diameter iron oxide core and damage-free neutral-beam etching (Si-ND diameter: 6.4nm). An Si-ND array with an SiO 2 matrix demonstrated more controllable optical bandgap energy due to the fine tunability of the Si-ND thickness and diameter. Unlike the case of shrinking Si-ND thickness, the case of shrinking Si-ND diameter simultaneously increased the optical absorption coefficient and the optical bandgap energy. The optical absorption coefficient became higher due to the decrease in the center-to-center distance of NDs to enhance wavefunction coupling. This means that our 6nm diameter Si-ND structure can satisfy the strict requirements of optical bandgap energy control and high absorption coefficient for achieving realistic Si quantum dot solar cells.

元の言語English
記事番号065302
ジャーナルNanotechnology
23
発行部数6
DOI
出版物ステータスPublished - 2012 2 17

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ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

これを引用

Budiman, M. F., Hu, W., Igarashi, M., Tsukamoto, R., Isoda, T., Itoh, K. M., Yamashita, I., Murayama, A., Okada, Y., & Samukawa, S. (2012). Control of optical bandgap energy and optical absorption coefficient by geometric parameters in sub-10nm silicon-nanodisc array structure. Nanotechnology, 23(6), [065302]. https://doi.org/10.1088/0957-4484/23/6/065302