Cryogenic CMOS Performance Analysis Including BEOL Characteristics at 4K for Quantum Controller Application

K. Okamoto, Takahisa Tanaka, M. Miyamura, H. Ishikuro, Ken Uchida, T. Sakamoto, M. Tada

研究成果: Conference contribution

抄録

Cryo-CMOS circuit performance at 4K including both BEOL and FEOL characteristics has been investigated in a 65nm bulk CMOS for the first time. ON-current (Ion) of n/pMOSFET are improved +25%/+9% with excellent gate modulation (Ion/Ioff=∼109). Cu line/via resistances decrease with temperature due to reduction of phonon scattering, and -75%/-20% lower resistances are obtained at 4K. It is revealed that there is no inter-line capacitance change and no severe Joule heating effect (JHE) of Cu BEOL at 4K. The newly developed 4K-SPICE model including BEOL characteristics enables accurate CMOS circuit design at 4K, giving 5 ∼ 40% faster operation of RC line with clear dependence on driver-size and interconnect-load.

本文言語English
ホスト出版物のタイトル2022 IEEE International Interconnect Technology Conference, IITC 2022
出版社Institute of Electrical and Electronics Engineers Inc.
ページ139-141
ページ数3
ISBN(電子版)9781665486460
DOI
出版ステータスPublished - 2022
イベント2022 IEEE International Interconnect Technology Conference, IITC 2022 - San Jose, United States
継続期間: 2022 6月 272022 6月 30

出版物シリーズ

名前2022 IEEE International Interconnect Technology Conference, IITC 2022

Conference

Conference2022 IEEE International Interconnect Technology Conference, IITC 2022
国/地域United States
CitySan Jose
Period22/6/2722/6/30

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学
  • 安全性、リスク、信頼性、品質管理
  • 電子材料、光学材料、および磁性材料

フィンガープリント

「Cryogenic CMOS Performance Analysis Including BEOL Characteristics at 4K for Quantum Controller Application」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル