Densification of SiO2 gel films by synchrotron radiation and its dependence on photon energy

Hiroaki Imai, Koichi Awazu, Masaru Yasumori, Hiroshi Hirashima, Hideo Onuki

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

The interaction of synchrotron radiation (SR) emitted from a polarizing undulator with SiO2 gel films was investigated by elipsometry and infrared spectroscopy. The photon energy in SR was varied in the range of 6.4-17.8 eV using an Onuki-type undulator in order to study the energy dependence of the interaction. We found that an increase of refractive index, a decrease of thickness of the films and a loss of OH groups were induced by photons with energies above approx.9 eV although any changes were not observed with photons below approx.7 eV. These results suggest that SiO2 gel films are densified through electronic processes stimulated by the energetic photons.

本文言語English
ページ(範囲)39-43
ページ数5
ジャーナルMaterials Research Society Symposium - Proceedings
375
出版ステータスPublished - 1995 1月 1
イベントProceedings of the 1994 MRS Fall Meeting - Boston, MA, USA
継続期間: 1994 11月 271994 12月 2

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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