Deposition of fluoropolymer thin films by vacuum-ultraviolet laser ablation

Y. Ueno, T. Fujii, F. Kannari

研究成果: Article査読

63 被引用数 (Scopus)

抄録

Crystalline thin films of polytetrafluoroethylene were deposited on Si(100) wafers by F2 laser (157 nm) ablation in 200 mTorr Ar gas atmosphere. X-ray photoemission spectra indicated that the composition of the deposited films was similar to the source material. The surface morphology of films deposited at room temperature contained numerous fibrous structures in size of 100-400 nm, but they were smoothed out at elevated wafer temperature of ∼370 K, while the crystalline feature was still maintained. The refractive index was ∼1.35 at 633 nm.

本文言語English
ページ(範囲)1370-1372
ページ数3
ジャーナルApplied Physics Letters
65
11
DOI
出版ステータスPublished - 1994

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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