TY - GEN
T1 - Design and the fabrication of a multi-level phase hologram using subwavelength-scale hole array structures
AU - Komada, Takehiro
AU - Ogawa, Masaya
AU - Hakamata, Masakatsu
AU - Tsuda, Hiroyuki
AU - Kitano, Nobuaki
PY - 2005
Y1 - 2005
N2 - The three-level phase hologram with 128 × 128 pixels of 10-??m square, 500-nm pitch hole array structures is fabricated. The clear diffracted image is generated for the light with a wavelength of 780 nm.
AB - The three-level phase hologram with 128 × 128 pixels of 10-??m square, 500-nm pitch hole array structures is fabricated. The clear diffracted image is generated for the light with a wavelength of 780 nm.
UR - http://www.scopus.com/inward/record.url?scp=85085402941&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85085402941&partnerID=8YFLogxK
U2 - 10.1364/fio.2005.fwl2
DO - 10.1364/fio.2005.fwl2
M3 - Conference contribution
AN - SCOPUS:85085402941
SN - 1557527970
SN - 9781557527974
T3 - Optics InfoBase Conference Papers
BT - Frontiers in Optics, FiO 2005
PB - Optical Society of America (OSA)
T2 - Frontiers in Optics, FiO 2005
Y2 - 16 October 2005 through 21 October 2005
ER -