TY - JOUR
T1 - Development of a light source with a uniform intensity reinforced by a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays
AU - Takahashi, Hidetoshi
AU - Shimoyama, Isao
AU - Jung Heo, Yun
N1 - Funding Information:
Acknowledgments This work is supported by National Research Foundation of Korea (NRF-2017R1C1B5076947). The EB photomask fabrication was performed using the EB lithography apparatus at the VLSI Design and Education Center (VDEC) at the University of Tokyo. The authors thank Mr. Takashi Nakamura for his advice on the UV-LED circuit.
Publisher Copyright:
© 2018 The Japan Society of Applied Physics.
PY - 2018/6
Y1 - 2018/6
N2 - This paper presents a simple, low-cost, long-lasting UV-LED-based light source with uniform light intensity using a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays. The light rays from the top UV-LED array passed through the transparent portions of the checkerboard half-mirror, while the light rays from the side UV-LED array were reflected on the remaining opaque portions at right angles. Thus, uniform light intensity was achieved on the bottom area. Using the developed UV-LED light source, we fabricated microstructures with uniform shapes on a large area, thereby showing feasible applications for MEMS fabrication.
AB - This paper presents a simple, low-cost, long-lasting UV-LED-based light source with uniform light intensity using a checkerboard half-mirror positioned within inverse L-shaped UV-LED arrays. The light rays from the top UV-LED array passed through the transparent portions of the checkerboard half-mirror, while the light rays from the side UV-LED array were reflected on the remaining opaque portions at right angles. Thus, uniform light intensity was achieved on the bottom area. Using the developed UV-LED light source, we fabricated microstructures with uniform shapes on a large area, thereby showing feasible applications for MEMS fabrication.
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U2 - 10.7567/APEX.11.066701
DO - 10.7567/APEX.11.066701
M3 - Article
AN - SCOPUS:85047935106
SN - 1882-0778
VL - 11
JO - Applied Physics Express
JF - Applied Physics Express
IS - 6
M1 - 066701
ER -