Development of cluster ion source based on modulated pulse power magnetron sputtering technique

C. H. Zhang, H. Tsunoyama, H. Akatsuka, H. Sekiya, T. Nagase, A. Nakajima

研究成果: Conference contribution

抄録

A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.

本文言語English
ホスト出版物のタイトル8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
ページ428-431
ページ数4
DOI
出版ステータスPublished - 2013 9月 2
イベント8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013 - Suzhou, China
継続期間: 2013 4月 72013 4月 10

出版物シリーズ

名前8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013

Other

Other8th Annual IEEE International Conference on Nano/Micro Engineered and Molecular Systems, IEEE NEMS 2013
国/地域China
CitySuzhou
Period13/4/713/4/10

ASJC Scopus subject areas

  • 生化学、遺伝学、分子生物学(その他)
  • バイオテクノロジー

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