Electro-rheological gel (ERG) is a functional material whose friction characteristic varies according to the intensity of an applied electric field. In this study, ERG is applied to the fixture element for a silicon wafer. Silicon wafers are used for semiconductor manufacturing, a process carried out in a vacuum. The purpose of this study is to clarify the basic characteristic of ERG in a vacuum. To investigate these characteristics, several tests were carried out using silicon wafers. In addition, the optimal shape of one-sided electrodes applying the electric field effectively was designed by means of a static electric field analysis.
|出版ステータス||Published - 2007 12月 1|
|イベント||4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007 - Fukuoka, Japan|
継続期間: 2007 11月 7 → 2007 11月 9
|Other||4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007|
|Period||07/11/7 → 07/11/9|
ASJC Scopus subject areas