Development of fixture element for vacuum transportation of silicon wafer using electro-rheological gel

Masayuki Tanaka; Yasuhiro Kakinuma; Tojiro Aoyama; Hidenobu Anzai; Takafumi Kawaguchi

Development of fixture element for vacuum transportation of silicon wafer using electro-rheological gel

Masayuki Tanaka, Yasuhiro Kakinuma, Tojiro Aoyama, Hidenobu Anzai, Takafumi Kawaguchi

研究成果: Paper › 査読

抄録

Electro-rheological gel (ERG) is a functional material whose friction characteristic varies according to the intensity of an applied electric field. In this study, ERG is applied to the fixture element for a silicon wafer. Silicon wafers are used for semiconductor manufacturing, a process carried out in a vacuum. The purpose of this study is to clarify the basic characteristic of ERG in a vacuum. To investigate these characteristics, several tests were carried out using silicon wafers. In addition, the optimal shape of one-sided electrodes applying the electric field effectively was designed by means of a static electric field analysis.

本文言語	English
出版ステータス	Published - 2007 12月 1
イベント	4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007 - Fukuoka, Japan 継続期間: 2007 11月 7 → 2007 11月 9

Other

Other	4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007
国/地域	Japan
City	Fukuoka
Period	07/11/7 → 07/11/9

ASJC Scopus subject areas

産業および生産工学

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引用スタイル

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title = "Development of fixture element for vacuum transportation of silicon wafer using electro-rheological gel",

abstract = "Electro-rheological gel (ERG) is a functional material whose friction characteristic varies according to the intensity of an applied electric field. In this study, ERG is applied to the fixture element for a silicon wafer. Silicon wafers are used for semiconductor manufacturing, a process carried out in a vacuum. The purpose of this study is to clarify the basic characteristic of ERG in a vacuum. To investigate these characteristics, several tests were carried out using silicon wafers. In addition, the optimal shape of one-sided electrodes applying the electric field effectively was designed by means of a static electric field analysis.",

keywords = "Electro-rheological fluid, Numerical analysis, One-sided electrodes, Silicon wafer, Vacuum",

author = "Masayuki Tanaka and Yasuhiro Kakinuma and Tojiro Aoyama and Hidenobu Anzai and Takafumi Kawaguchi",

year = "2007",

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note = "4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007 ; Conference date: 07-11-2007 Through 09-11-2007",

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T1 - Development of fixture element for vacuum transportation of silicon wafer using electro-rheological gel

AU - Tanaka, Masayuki

AU - Kakinuma, Yasuhiro

AU - Aoyama, Tojiro

AU - Anzai, Hidenobu

AU - Kawaguchi, Takafumi

PY - 2007/12/1

Y1 - 2007/12/1

N2 - Electro-rheological gel (ERG) is a functional material whose friction characteristic varies according to the intensity of an applied electric field. In this study, ERG is applied to the fixture element for a silicon wafer. Silicon wafers are used for semiconductor manufacturing, a process carried out in a vacuum. The purpose of this study is to clarify the basic characteristic of ERG in a vacuum. To investigate these characteristics, several tests were carried out using silicon wafers. In addition, the optimal shape of one-sided electrodes applying the electric field effectively was designed by means of a static electric field analysis.

AB - Electro-rheological gel (ERG) is a functional material whose friction characteristic varies according to the intensity of an applied electric field. In this study, ERG is applied to the fixture element for a silicon wafer. Silicon wafers are used for semiconductor manufacturing, a process carried out in a vacuum. The purpose of this study is to clarify the basic characteristic of ERG in a vacuum. To investigate these characteristics, several tests were carried out using silicon wafers. In addition, the optimal shape of one-sided electrodes applying the electric field effectively was designed by means of a static electric field analysis.

KW - Electro-rheological fluid

KW - Numerical analysis

KW - One-sided electrodes

KW - Silicon wafer

KW - Vacuum

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M3 - Paper

AN - SCOPUS:84883401238

T2 - 4th International Conference on Leading Edge Manufacturing in 21st Century, LEM 2007

Y2 - 7 November 2007 through 9 November 2007

ER -

Development of fixture element for vacuum transportation of silicon wafer using electro-rheological gel

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