Diagnostics of an inductively coupled CF4/Ar plasma

Kazuya Hioki, Hajime Hirata, Shosaku Matsumura, Zoran Lj Petrović, Toshiaki Makabe

研究成果: Article査読

37 被引用数 (Scopus)

抄録

The properties of a mixture of argon and CF4 were studied. This mixture is used in plasma etching of SiO2 and more importantly its properties may be compared to those of the pure argon plasma to observe the effect of CF4 kinetics, especially the effect of the presence of negative ions. The experimental studies carried out serve as the basis for tests of theoretical models of inductively coupled plasma which are the foundation for computer aided design (CAD) and control of the next generation plasma devices that are being developed.

本文言語English
ページ(範囲)864-872
ページ数9
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
18
3
DOI
出版ステータスPublished - 2000 1 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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