Dry etching and low-temperature direct bonding process of lithium niobate wafer for fabricating micro/nano channel device

Toshiyuki Tsuchiya, Koji Sugano, Hideki Takahashi, Hangyeol Seo, Yuriy Pihosh, Yutaka Kazoe, Kazuma Mawatari, Takehiko Kitamori, Osamu Tabata

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

We have developed dry etching process of lithium niobate (LN) wafer using neutral loop discharge reactive ion etching (NLD-RIE) to fabricate both micro- and nano-channels for investigating proton diffusion enhancement in ferroelectric nanochannels. We have also developed low-temperature direct bonding process between LN wafers. Two-hundred parallel nanochannel array of 200-nm deep and wide and 400-μm long connected to two microchannels (width: 500 μm, depth: 5.9 μm) at the both ends were fabricated. We have succeeded in measuring the proton diffusion coefficient as high as 1.2×10-8 m2/s.

本文言語English
ホスト出版物のタイトルTRANSDUCERS 2017 - 19th International Conference on Solid-State Sensors, Actuators and Microsystems
出版社Institute of Electrical and Electronics Engineers Inc.
ページ1245-1248
ページ数4
ISBN(電子版)9781538627310
DOI
出版ステータスPublished - 2017 7 26
外部発表はい
イベント19th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2017 - Kaohsiung, Taiwan, Province of China
継続期間: 2017 6 182017 6 22

出版物シリーズ

名前TRANSDUCERS 2017 - 19th International Conference on Solid-State Sensors, Actuators and Microsystems

Other

Other19th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2017
国/地域Taiwan, Province of China
CityKaohsiung
Period17/6/1817/6/22

ASJC Scopus subject areas

  • 化学的な安全衛生
  • 器械工学
  • 電子工学および電気工学

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