Effect of dilution gas on hardness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure plasma enhanced CVD

M. Noborisaka, Y. Tachimoto, R. Horikoshi, A. Shirakura, T. Suzuki

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

The deposition of hydrogenated amorphous carbon (a-C:H)-based films at atmospheric pressure is a cost-effective process without using a high-vacuum technique. In this study, we synthesized a-C:H-based films by atmospheric pressure-plasma enhanced CVD method from C2H2/He and C2H2/N2 mixture gas and investigated the effect of dilution gas on the hardness of the films. The film deposited from C 2H2/N2 contained nitrogen elements with forming C-N bonds and the film was softer than a-C:H film deposited from C 2H2/He. The hardness of the film deposited from C 2H2/He was 1.1 GPa and twice higher than that from C 2H2/N2.

本文言語English
論文番号012044
ジャーナルJournal of Physics: Conference Series
417
1
DOI
出版ステータスPublished - 2013
イベント15th International Conference on Thin Films, ICTF 2011 - Kyoto, Japan
継続期間: 2011 11 82011 11 11

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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