The deposition of hydrogenated amorphous carbon (a-C:H)-based films at atmospheric pressure is a cost-effective process without using a high-vacuum technique. In this study, we synthesized a-C:H-based films by atmospheric pressure-plasma enhanced CVD method from C2H2/He and C2H2/N2 mixture gas and investigated the effect of dilution gas on the hardness of the films. The film deposited from C 2H2/N2 contained nitrogen elements with forming C-N bonds and the film was softer than a-C:H film deposited from C 2H2/He. The hardness of the film deposited from C 2H2/He was 1.1 GPa and twice higher than that from C 2H2/N2.
|ジャーナル||Journal of Physics: Conference Series|
|出版ステータス||Published - 2013|
|イベント||15th International Conference on Thin Films, ICTF 2011 - Kyoto, Japan|
継続期間: 2011 11 8 → 2011 11 11
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