Effect of metastables on a sustaining mechanism in inductively coupled plasma in Ar

Toshikazu Sato, Toshiaki Makabe

研究成果: Article査読

28 被引用数 (Scopus)

抄録

We numerically predicted the spatial distribution of Ar metastables in an inductively coupled plasma (ICP) source; this distribution may be an indicator of the behavior of long-lived neutral radicals in a reactive plasma. We investigated the effect of metastables on the sustaining mechanism in ICP in Ar. The predicted two-dimensional profile of Ar metastables agreed reasonably well with experimental results. The transition of the sustaining mechanism from direct ionization to stepwise ionization is found as a function of input power at 50 mTorr. In addition, a strong hysteresis of plasma density is predicted between the increasing and decreasing phases of the input power based on the stepwise ionization of Ar metastables in the ICP.

本文言語English
論文番号113304
ジャーナルJournal of Applied Physics
98
11
DOI
出版ステータスPublished - 2005

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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