Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method

Mayui Noborisaka, So Nagashima, Hidetaka Hayashi, Naoharu Ueda, Kyoko Kumagai, Akira Shirakura, Tetsuya Suzuki

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

Silicon-based films have gained much interest as protective coatings for transparent polymeric materials. In this study, SiOC(-H) thin films were deposited on polycarbonate (PC) or Si substrates from trimethylsilane (TrMS) gas diluted with He gas by atmospheric pressure plasma enhanced CVD (AP-PECVD) method with varying substrate temperature, and transparency and hardness of the films were investigated. The films exhibited a good optical transparency with an optical transmittance of about 90% irrespective of the substrate temperature, and the hardness increased from 0.6 to 1.3 GPa as the substrate temperature increased from 60 to 140°C. The results are discussed in terms of chemical structural changes in the films according to the substrate temperature.

本文言語English
ホスト出版物のタイトルAmorphous and Polycrystalline Thin-Film Silicon Science and Technology - 2011
ページ217-222
ページ数6
DOI
出版ステータスPublished - 2012
イベント2011 MRS Spring Meeting - San Francisco, CA, United States
継続期間: 2011 4月 25 → 2011 4月 29

出版物シリーズ

名前Materials Research Society Symposium Proceedings
巻1321
ISSN（印刷版）0272-9172

Other

Other2011 MRS Spring Meeting
国/地域United States
CitySan Francisco, CA
Period11/4/25 → 11/4/29

ASJC Scopus subject areas

  • 材料科学（全般）
  • 凝縮系物理学
  • 材料力学
  • 機械工学

文献へのアクセス

他のファイルとリンク

フィンガープリント

「Effect of substrate temperature on hardness and transparency of SiOC(-H) thin films synthesized by atmospheric pressure plasma enhanced CVD method」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。
完全なフィンガープリントを表示

引用スタイル