Effective insulating properties of autooxidized monolayers using organic ditellurides

Tohru Nakamura, Satoshi Yasuda, Takayuki Miyamae, Hisakazu Nozoye, Nobuhiko Kobayashi, Hiroshi Kondoh, Ikuyo Nakai, Toshiaki Ohta, Daisuke Yoshimura, Mutsuyoshi Matsumoto

研究成果: Article査読

25 被引用数 (Scopus)

抄録

Dialkyl ditellurides adsorb on Au(111) surfaces by wet deposition to form highly resistive autooxidized monolayers (AMs) due to the automatic formation of oxidized tellurium species after the adsorption of ditellurides on the surfaces under air in contrast to the case of the lighter dichalcogenides such as disulfides and diselenides. The ditelluride AMs could be applied to the selective fabrication of effective resistance, ferroelectric layers, piezoelectric parts, and/or new imaging systems using the feature of tellurium oxide in small device circuits.

本文言語English
ページ(範囲)12642-12643
ページ数2
ジャーナルJournal of the American Chemical Society
124
43
DOI
出版ステータスPublished - 2002 10 30
外部発表はい

ASJC Scopus subject areas

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

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