Effects of KrF laser irradiation on Bi nanoclusters embedded in a-SiO2 by ion implantation

Seung Y. Park, Tetsuhiko Isobe, Mamoru Senna, Robert A. Weeks, Raymond A. Zuhr

研究成果: Article査読

16 被引用数 (Scopus)

抄録

Bismuth nanoclusters have been formed in optical grade silica glass (Corning 7940) by ion implantation which formed localized Bi:SiO2 composite in the near-surface region. Subsequent irradiation with 248 nm KrF excimer laser light modifies the distribution and chemical states of the implanted bismuth in the composite. Excimer laser irradiation causes not only photochemical reactions in the composite leaving a thin film of bismuth oxide on the surface, but also removal of the precipitated particles by both thermal and nonthermal desorption mechanisms from the surface.

本文言語English
ページ(範囲)2687-2689
ページ数3
ジャーナルApplied Physics Letters
73
18
DOI
出版ステータスPublished - 1998 12 1

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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