Effects of ultraviolet irradiation and corona discharge on the crystallization from NiO/SiO2 mixed gels

Tetsuhiko Isobe, Satoshi Omura, Mamoru Senna

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Fine particles and thin films of NiO/SiO2 mixed gels, prepared from a bidentate alkoxide, were irradiated by a XeCl excimer laser or by a corona discharge. A part of NiO was initially dissolved in SiO2, and was segregated and crystallized on heating at 10 K min-1 to 800°C in air. Subsequently, amorphous SiO2 crystallized into cristobalite at 900°C. Based on the change in the interplanar spacing of cristobalite, ultraviolet irradiation or discharge promoted the segragation of NiO. Transmission electron micrographs of substrateless gel thin films revealed that corona discharge treatment brought about the formation of uniform NiO particles as small as 5 nm.

本文言語English
ページ(範囲)367-371
ページ数5
ジャーナルJournal of Non-Crystalline Solids
179
C
DOI
出版ステータスPublished - 1994 11月 4

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 凝縮系物理学
  • 材料化学

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