Enhanced Drain Current in Transient Mode due to Long Ionization Time of Shallow Impurities at 4 K in 65-nm bulk Cryo CMOS Transistors

Tomohisa Miyao, Takahisa Tanaka, Itsuki Imanishi, Masayuki Ichikawa, Shuya Nakagawa, Hiroki Ishikuro, Toshitsugu Sakamoto, Munehiro Tada, Ken Uchida

研究成果: Conference contribution

抄録

Despite the importance of cryo CMOS technologies in quantum computing systems, the transient behaviors of cryo MOS transistors have been less studied. In this work, in advanced CMOS transistors we observed sub-us transient drain current (IdTrans) that was much greater than the static drain current (IdStatic) at 4 K (Fig. 6); the transient-to-static ratio r=IdTrans/IdStatic reached as large as 2.7 (Fig. 9), whereas r stays at one in the same device at 20 K. The observed transient characteristics are not due to the self-heating effects, but due to the long emission time of holes from acceptors at 4 K. After applying biases, more electrons flow into the channel than those in static conditions to mitigate the frozen acceptors. IdTrans. goes down to IdStatic because of gradual ionization of acceptors. We consider that the observed transient behavior needs to be considered in cryo MOSFET model to accurately design cryo LSI circuits.

本文言語English
ホスト出版物のタイトル2022 Device Research Conference, DRC 2022
出版社Institute of Electrical and Electronics Engineers Inc.
ISBN(電子版)9781665498838
DOI
出版ステータスPublished - 2022
イベント2022 Device Research Conference, DRC 2022 - Columbus, United States
継続期間: 2022 6月 262022 6月 29

出版物シリーズ

名前Device Research Conference - Conference Digest, DRC
2022-June
ISSN(印刷版)1548-3770

Conference

Conference2022 Device Research Conference, DRC 2022
国/地域United States
CityColumbus
Period22/6/2622/6/29

ASJC Scopus subject areas

  • 電子工学および電気工学

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