Fabrication of arrays of tapered silicon micro-/nano-pillars by metal-assisted chemical etching and anisotropic wet etching

Engineering & Materials Science

• Anisotropic etching 100%
• Wet etching 89%
• Etching 69%
• Silicon 50%
• Potassium hydroxide 48%
• Fabrication 47%
• Metals 41%
• Silicon wafers 38%
• Aspect ratio 29%
• Geometry 19%

Chemical Compounds

• Etching 57%
• Potassium Hydroxide 23%
• Rod Like Crystal 20%
• Application 6%