抄録
As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.
本文言語 | English |
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ページ(範囲) | 25636-25639 |
ページ数 | 4 |
ジャーナル | RSC Advances |
巻 | 3 |
号 | 48 |
DOI | |
出版ステータス | Published - 2013 12 28 |
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)