Fabrication of boron doped diamond chip electrodes for single drop analysis

As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.