Fabrication of carbon nanotube via interconnects at low temperature and their robustness over a high-density current

Shintaro Sato, Akio Kawabata, Tatsuhiro Nozue, Daiyu Hondo, Tomo Murakami, Takashi Hyakushima, Mizuhisa Nihei, Yuji Awano

研究成果: Article

8 引用 (Scopus)

抄録

We fabricated carbon nanotube (CNT) via interconnects (vertical wiring) and evaluated their robustness over a high-density current. Multiwalled carbon nanotubes (MWNTs) were grown at temperatures as low as 365°C using Co catalyst nanoparticles, which were formed and deposited by a custom-designed particle generation and deposition system. MWNTs were successfully grown in via holes with a diameter as small as 40 nm. The resistance of CNT vias with a diameter of 160 nm was found to be of the same order as that of tungsten plugs. The CNT vias were able to sustain a current density as high as 5.0×10 6 A/cm2 at 105°C for 100 h without any deterioration in their properties.

元の言語English
ページ(範囲)373-383
ページ数11
ジャーナルSensors and Materials
21
発行部数7
出版物ステータスPublished - 2009
外部発表Yes

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Carbon Nanotubes
Carbon nanotubes
Current density
Multiwalled carbon nanotubes (MWCN)
carbon nanotubes
current density
Fabrication
fabrication
Tungsten
Electric wiring
Temperature
Deterioration
wiring
Nanoparticles
plugs
Catalysts
deterioration
tungsten
catalysts
nanoparticles

ASJC Scopus subject areas

  • Instrumentation
  • Materials Science(all)

これを引用

Sato, S., Kawabata, A., Nozue, T., Hondo, D., Murakami, T., Hyakushima, T., ... Awano, Y. (2009). Fabrication of carbon nanotube via interconnects at low temperature and their robustness over a high-density current. Sensors and Materials, 21(7), 373-383.

Fabrication of carbon nanotube via interconnects at low temperature and their robustness over a high-density current. / Sato, Shintaro; Kawabata, Akio; Nozue, Tatsuhiro; Hondo, Daiyu; Murakami, Tomo; Hyakushima, Takashi; Nihei, Mizuhisa; Awano, Yuji.

:: Sensors and Materials, 巻 21, 番号 7, 2009, p. 373-383.

研究成果: Article

Sato, S, Kawabata, A, Nozue, T, Hondo, D, Murakami, T, Hyakushima, T, Nihei, M & Awano, Y 2009, 'Fabrication of carbon nanotube via interconnects at low temperature and their robustness over a high-density current', Sensors and Materials, 巻. 21, 番号 7, pp. 373-383.
Sato S, Kawabata A, Nozue T, Hondo D, Murakami T, Hyakushima T その他. Fabrication of carbon nanotube via interconnects at low temperature and their robustness over a high-density current. Sensors and Materials. 2009;21(7):373-383.
Sato, Shintaro ; Kawabata, Akio ; Nozue, Tatsuhiro ; Hondo, Daiyu ; Murakami, Tomo ; Hyakushima, Takashi ; Nihei, Mizuhisa ; Awano, Yuji. / Fabrication of carbon nanotube via interconnects at low temperature and their robustness over a high-density current. :: Sensors and Materials. 2009 ; 巻 21, 番号 7. pp. 373-383.
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