Fabrication of transparent conductive zinc oxide films by chemical bath deposition using solutions containing Zn<sup>2+</sup>and Al<sup>3+</sup> ions

Takahiro Morita, Shintaro Ueno, Eiji Hosono, Haoshen Zhou, Manabu Hagiwara, Shinobu Fujihara

研究成果: Article

1 引用 (Scopus)

抄録

Transparent ZnO films were fabricated on glass substrates by a chemical bath deposition method using zinc acetate solutions also containing AlCl<inf>3</inf>. A predominant effect of the Al<sup>3+</sup> addition seemed to be suppression of the growth of ZnO crystals and change of the crystallographic orientation of ZnO films. The c-axis and the a-axis of the ZnO films came to stand parallel and vertical to the substrate, respectively, by increasing the Al<sup>3+</sup> concentration. A post ultraviolet irradiation to the films led to a decrease in the sheet resistance from the order of 10<sup>6</sup> to 10<sup>4</sup> Ω·sq.<sup>-1</sup> without changing the morphology or the crystallinity. This might be related to the photocatalytic effect of ZnO to decompose residual organics in the films and increase the number of carriers. The ZnO film obtained from the solution with 1.0 mol % AlCl<inf>3</inf> showed the lowest sheet resistance of 2.5 × 10<sup>4</sup> Ω·sq.<sup>-1</sup>.

元の言語English
ページ(範囲)329-334
ページ数6
ジャーナルNippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan
123
発行部数1437
DOI
出版物ステータスPublished - 2015

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Zinc Oxide
Zinc oxide
zinc oxides
Oxide films
oxide films
baths
Ions
Fabrication
fabrication
ions
Sheet resistance
Zinc Acetate
Substrates
Crystal orientation
acetates
crystallinity
Zinc
zinc
retarding
Irradiation

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry
  • Chemistry(all)
  • Condensed Matter Physics

これを引用

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title = "Fabrication of transparent conductive zinc oxide films by chemical bath deposition using solutions containing Zn2+and Al3+ ions",
abstract = "Transparent ZnO films were fabricated on glass substrates by a chemical bath deposition method using zinc acetate solutions also containing AlCl3. A predominant effect of the Al3+ addition seemed to be suppression of the growth of ZnO crystals and change of the crystallographic orientation of ZnO films. The c-axis and the a-axis of the ZnO films came to stand parallel and vertical to the substrate, respectively, by increasing the Al3+ concentration. A post ultraviolet irradiation to the films led to a decrease in the sheet resistance from the order of 106 to 104 Ω·sq.-1 without changing the morphology or the crystallinity. This might be related to the photocatalytic effect of ZnO to decompose residual organics in the films and increase the number of carriers. The ZnO film obtained from the solution with 1.0 mol {\%} AlCl3 showed the lowest sheet resistance of 2.5 × 104 Ω·sq.-1.",
keywords = "Chemical bath deposition, Oriented film, Transparent conductive oxide, Uv irradiation, ZnO",
author = "Takahiro Morita and Shintaro Ueno and Eiji Hosono and Haoshen Zhou and Manabu Hagiwara and Shinobu Fujihara",
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T1 - Fabrication of transparent conductive zinc oxide films by chemical bath deposition using solutions containing Zn2+and Al3+ ions

AU - Morita, Takahiro

AU - Ueno, Shintaro

AU - Hosono, Eiji

AU - Zhou, Haoshen

AU - Hagiwara, Manabu

AU - Fujihara, Shinobu

PY - 2015

Y1 - 2015

N2 - Transparent ZnO films were fabricated on glass substrates by a chemical bath deposition method using zinc acetate solutions also containing AlCl3. A predominant effect of the Al3+ addition seemed to be suppression of the growth of ZnO crystals and change of the crystallographic orientation of ZnO films. The c-axis and the a-axis of the ZnO films came to stand parallel and vertical to the substrate, respectively, by increasing the Al3+ concentration. A post ultraviolet irradiation to the films led to a decrease in the sheet resistance from the order of 106 to 104 Ω·sq.-1 without changing the morphology or the crystallinity. This might be related to the photocatalytic effect of ZnO to decompose residual organics in the films and increase the number of carriers. The ZnO film obtained from the solution with 1.0 mol % AlCl3 showed the lowest sheet resistance of 2.5 × 104 Ω·sq.-1.

AB - Transparent ZnO films were fabricated on glass substrates by a chemical bath deposition method using zinc acetate solutions also containing AlCl3. A predominant effect of the Al3+ addition seemed to be suppression of the growth of ZnO crystals and change of the crystallographic orientation of ZnO films. The c-axis and the a-axis of the ZnO films came to stand parallel and vertical to the substrate, respectively, by increasing the Al3+ concentration. A post ultraviolet irradiation to the films led to a decrease in the sheet resistance from the order of 106 to 104 Ω·sq.-1 without changing the morphology or the crystallinity. This might be related to the photocatalytic effect of ZnO to decompose residual organics in the films and increase the number of carriers. The ZnO film obtained from the solution with 1.0 mol % AlCl3 showed the lowest sheet resistance of 2.5 × 104 Ω·sq.-1.

KW - Chemical bath deposition

KW - Oriented film

KW - Transparent conductive oxide

KW - Uv irradiation

KW - ZnO

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