Femtosecond laser near-field nanoablation patterning using Mie resonance high dielectric constant particle with small size parameter

Yuto Tanaka, Go Obara, Akira Zenidaka, Mitsuhiro Terakawa, Minoru Obara

研究成果: Article査読

33 被引用数 (Scopus)

抄録

We demonstrate near-field nanohole patterning using a Mie resonance, small size parameter particle for nanofabrication technology regardless of substrate's refractive index. Maximal enhancement factor and nearly smallest spot diameter among the same size dielectric particles are simultaneously obtainable on both low-refractive-index SiO2 and high-refractive-index Si substrates with a 200 nm particle of magnetic quadrupole resonance scattering mode (n∼2.7) at 400 nm excitation wavelength. Circular nanoholes with approximately 100 nm in diameter were fabricated on both substrates using a 200 nm amorphous TiO2 particle (n=2.66+0.024i) even with lower laser fluences than a half ablation threshold of the bare substrates.

本文言語English
論文番号261103
ジャーナルApplied Physics Letters
96
26
DOI
出版ステータスPublished - 2010 6 28

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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