Formation of polymer microneedle arrays using soft lithography

Yoshimichi Ami, Hiroto Tachikawa, Naoki Takano, Norihisa Miki

研究成果: Article査読

25 被引用数 (Scopus)

抄録

We demonstrate the fabrication of polymer microneedle arrays using soft lithography. A photomask was designed to use Fresnel diffraction of UV light to create sharp, tapered hollows in SU-8, a negative photoresist, after development. Polymer microneedles were formed using these SU-8 structures as a mold. These polymer needles may be applicable as flexible electrodes in brain-machine interfaces because they are more likely to survive movement of the skin than conventional brittle silicon needles. Similar needles, made from medicinal substances, could be used for transdermal drug administration. For these applications, the needles must be long, sharp, and stiff enough to penetrate the stratum corneum (∼20 m in thickness) and reach the viable epidermis (200-300 m in thickness), but must not reach the dermis, which contains sensitive nerve endings. We successfully manufactured 2020 microneedle arrays of polydimethylsiloxane with a needle length of 200 m. We experimentally verified that these manufactured electrodes successfully penetrated the stratum corneum of a cultured skin.

本文言語English
論文番号011503
ジャーナルJournal of Micro/Nanolithography, MEMS, and MOEMS
10
1
DOI
出版ステータスPublished - 2011 1 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 機械工学
  • 電子工学および電気工学

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