Growth process of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD using nitrogen and helium as a dilution gas

Takanori Mori, Takachika Sakurai, Taiki Sato, Akira Shirakura, Tetsuya Suzuki

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Hydrogenated amorphous carbon films with various thicknesses were synthesized by dielectric barrier discharge-based plasma deposition under atmospheric pressure diluted with nitrogen (N2) and helium (He) at various pulse frequencies. The C2H2/N2 film showed cauliflower-like-particles that grew bigger with the increase in film's thickness. At 5 kHz, the film with a thickness of 2.7μm and smooth surface was synthesized. On the other hand, the films synthesized from C2H2/He had a smooth surface and was densely packed with domed particles. The domed particles extended with the increase in the film thickness, enabling it to grow successfully to 37μm with a smooth surface.

本文言語English
論文番号045503
ジャーナルJapanese Journal of Applied Physics
55
4
DOI
出版ステータスPublished - 2016 4 1

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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