抄録
To synthesize hydrogenated amorphous carbon (a-C:H) films, filamentary dielectric discharge (FDBD) is used to improve their mechanical properties compared to the films synthesized by glow dielectric barrier discharge (GDBD), which is generally used for atmospheric pressure-plasma-enhanced chemical vapor deposition. The discharge form transitioned from GDBD to FDBD when the gap between the electrodes is increased from 1 to 4 mm. The hardness of the films increased from 3.7 to 11.9 GPa by using FDBD. The results indicate that hard a-C:H films can be synthesized at room temperature by atmospheric pressure using FDBD.
本文言語 | English |
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論文番号 | 1800084 |
ジャーナル | Macromolecular Symposia |
巻 | 382 |
号 | 1 |
DOI | |
出版ステータス | Published - 2018 12月 |
ASJC Scopus subject areas
- 凝縮系物理学
- 有機化学
- ポリマーおよびプラスチック
- 材料化学