Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

Mayui Noborisaka, Ryohei Horikoshi, So Nagashima, Akira Shirakura, Tetsuya Suzuki

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Hydrogenated amorphous carbon (a-C:H)-based films were synthesized by the dielectric barrier discharge-based plasma deposition at atmospheric pressure from C2H2 diluted with He or N2 gas with varying dilution ratios (R) and their hardness, surface roughness and chemical composition were analyzed. The films deposited from C2H 2/N2 contained nitrogen elements and they were softer with rougher surface compared with the a-C:H films deposited from C 2H2/He. Additionally the amount of nitrogen incorporation increased as the ratio R decreased, which led to deterioration of hardness and surface smoothness. As for C2H2/He, the film hardness slightly increased by decreasing the ratio R and the a-C:H (R = 1%) showed a maximum hardness of 1.1 GPa.

本文言語English
ページ(範囲)114-119
ページ数6
ジャーナルThin Solid Films
527
DOI
出版ステータスPublished - 2013 1 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 表面および界面
  • 表面、皮膜および薄膜
  • 金属および合金
  • 材料化学

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