Hardness and surface roughness of hydrogenated amorphous carbon films synthesized by atmospheric pressure plasma enhanced CVD method with various pulse frequencies

T. Sakurai, M. Noborisaka, T. Hirako, A. Shirakura, T. Suzuki

研究成果: Article査読

12 被引用数 (Scopus)

抄録

Atmospheric pressure plasma enhanced chemical vapor deposition (AP-PECVD) has attracted much attention for its cost-effectiveness owing to eliminate the use of vacuum devices. We synthesized hydrogenated amorphous carbon (a-C:H) films under atmospheric pressure from C2H2 gas diluted with N2 with varying pulse frequency of plasma source. We investigated the effect of surface texture and chemical bonding structure of the films on hardness. The hardness, surface roughness and chemical content ratio were analyzed by tribo scope nano-mechanical indentation tester, atomic force microscope (AFM) and X-ray photoelectron spectroscopy (XPS), respectively. As the pulse frequency decreased from 10 to 2kHz, the hardness increased from 0.35 to 0.92GPa and the surface roughness decreased from 49.8 to 14.3nm. From the result of XPS analysis, the N/C molar ratio increased from 0.022 to 0.094 with increasing the pulse frequency.

本文言語English
ページ(範囲)460-464
ページ数5
ジャーナルSurface and Coatings Technology
215
DOI
出版ステータスPublished - 2013 1 25

ASJC Scopus subject areas

  • 化学 (全般)
  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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