High efficiency operation of the XeF (B → X) laser using a low pressure and room temperature Ar/Xe/F2 mixture pumped by a short pulse electron beam

Toshiaki Takashima, Fumihiko Kannari, Minoru Obara

    研究成果: Conference contribution

    抜粋

    A computer simulation code for an electron-beam-excited XeF(B → X) laser using Ar/Xe/F2 mixtures was constructed on a point source model and solves rate equations for twenty-six species and gas electron temperatures by a Runge-Kutta method. These equations include about 150 reactions. Experiments were carried out for a gas mixture of 93.2% Ar, 6.0% Xe, and 0.8% F2. Calculations at room temperature and low pressure (< 1atm) show good agreement with experimental results. A high intrinsic efficiency of approximately 3% is obtained at an excitation rate of 0.5-2.0 MW/cm3-atm. This result is attributed to the reduced formation of absorption species.

    元の言語English
    ホスト出版物のタイトルCONFERENCE ON LASERS AND ELECTRO-0PTICS
    編集者 Anon
    出版者Publ by IEEE
    ページ260-261
    ページ数2
    ISBN(印刷物)1557520860
    出版物ステータスPublished - 1989 12 1
    イベントSummaries of Papers Presented at the Conference on Lasers and Electro-Optics - Baltimore, MD, USA
    継続期間: 1989 4 241989 4 28

    出版物シリーズ

    名前CONFERENCE ON LASERS AND ELECTRO-0PTICS

    Other

    OtherSummaries of Papers Presented at the Conference on Lasers and Electro-Optics
    Baltimore, MD, USA
    期間89/4/2489/4/28

    ASJC Scopus subject areas

    • Engineering(all)

    フィンガープリント High efficiency operation of the XeF (B → X) laser using a low pressure and room temperature Ar/Xe/F<sub>2</sub> mixture pumped by a short pulse electron beam' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Takashima, T., Kannari, F., & Obara, M. (1989). High efficiency operation of the XeF (B → X) laser using a low pressure and room temperature Ar/Xe/F2 mixture pumped by a short pulse electron beam. : Anon (版), CONFERENCE ON LASERS AND ELECTRO-0PTICS (pp. 260-261). (CONFERENCE ON LASERS AND ELECTRO-0PTICS). Publ by IEEE.