High efficiency operation of the XeF (B → X) laser using a low pressure and room temperature Ar/Xe/F2 mixture pumped by a short pulse electron beam

Toshiaki Takashima, Fumihiko Kannari, Minoru Obara

    研究成果: Conference contribution

    抄録

    A computer simulation code for an electron-beam-excited XeF(B → X) laser using Ar/Xe/F2 mixtures was constructed on a point source model and solves rate equations for twenty-six species and gas electron temperatures by a Runge-Kutta method. These equations include about 150 reactions. Experiments were carried out for a gas mixture of 93.2% Ar, 6.0% Xe, and 0.8% F2. Calculations at room temperature and low pressure (< 1atm) show good agreement with experimental results. A high intrinsic efficiency of approximately 3% is obtained at an excitation rate of 0.5-2.0 MW/cm3-atm. This result is attributed to the reduced formation of absorption species.

    本文言語English
    ホスト出版物のタイトルCONFERENCE ON LASERS AND ELECTRO-0PTICS
    編集者 Anon
    出版社Publ by IEEE
    ページ260-261
    ページ数2
    ISBN(印刷版)1557520860
    出版ステータスPublished - 1989 12 1
    イベントSummaries of Papers Presented at the Conference on Lasers and Electro-Optics - Baltimore, MD, USA
    継続期間: 1989 4 241989 4 28

    出版物シリーズ

    名前CONFERENCE ON LASERS AND ELECTRO-0PTICS

    Other

    OtherSummaries of Papers Presented at the Conference on Lasers and Electro-Optics
    CityBaltimore, MD, USA
    Period89/4/2489/4/28

    ASJC Scopus subject areas

    • Engineering(all)

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