High-pressure NO-induced mixed phase on Rh(111): Chemically driven replacement

Ryo Toyoshima, Masaaki Yoshida, Yuji Monya, Kazuma Suzuki, Kenta Amemiya, Kazuhiko Mase, Bongjin Simon Mun, Hiroshi Kondoh

研究成果: Article査読

10 被引用数 (Scopus)

抄録

The interaction between nitric oxide (NO) and Rh(111) surface has been investigated by a combination of near-ambient-pressure X-ray photoelectron spectroscopy, low energy electron diffraction, and density functional theory calculations. Under low-temperature and ultrahigh vacuum conditions, our experimental and computational results are consistent with the previous reports for NO adsorption phases on Rh(111). While at room temperature and upon exposure to gaseous NO of 100 mTorr, NO molecules partially dissociate followed by chemical removal of atomic nitrogen by NO from the surface, and the remaining atomic oxygen and NO form a NO/O mixed phase. Interestingly, this mixed phase is stable even after NO evacuation and shows a well-ordered (2 × 2) periodicity. These observations provide a new insight into the NO/Rh(111) system under near-ambient-pressure condition.

本文言語English
ページ(範囲)3033-3039
ページ数7
ジャーナルJournal of Physical Chemistry C
119
6
DOI
出版ステータスPublished - 2015 2 12

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Energy(all)
  • Physical and Theoretical Chemistry
  • Surfaces, Coatings and Films

フィンガープリント 「High-pressure NO-induced mixed phase on Rh(111): Chemically driven replacement」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル