High Spatial Resolution OBIRCH and OBIC Effects Realized by Near-field Optical Probe in the Analysis of High Resistance 200 nm Wide TiSi Line

K. Nikawa, T. Saiki, S. Inoue, M. Ohtsu

研究成果: Paper査読

3 被引用数 (Scopus)

抄録

The optical-beam-induced resistance-change-detection (OBRICH) method which used near-field-optical-probe as heat source was investigated for high resolution 200 nm wide TiSi line. The OBRICH used laser-beam heating and resistance-change detection processes. An Ar laser was introduced to test NF-OBIRCH method into near-field optical probe and was scanned in the area of interest which used shear force feedback technique. The results show that the OBIRCH method had higher spatial resolution and the method caused by heating was observed when metallized probe was used without interference from the optical beam induced current (OBIC).

本文言語English
ページ25-29
ページ数5
出版ステータスPublished - 1998
外部発表はい
イベントProceedings of the 24th Symposium for Testing and Failure Analysis - Dallas, TX, United States
継続期間: 1998 11 151998 11 19

Other

OtherProceedings of the 24th Symposium for Testing and Failure Analysis
国/地域United States
CityDallas, TX
Period98/11/1598/11/19

ASJC Scopus subject areas

  • 制御およびシステム工学
  • 安全性、リスク、信頼性、品質管理
  • 電子工学および電気工学

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