Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications

Sae Tanaka, Hayate Endo, Akira Shirakura, Shinya Kudo, Tetsuya Suzuki

研究成果: Article査読

抄録

A silica-based thin film was synthesized on polycarbonate substrates topped with acrylic primer. The synthesis was performed by chemical vapor deposition under a remote-type atmospheric pressure plasma. The source gas used was TrMS/O2, and the carrier gas used was either He or Ar. The abrasion resistance and adhesion strength were improved by changing the carrier gas from He to Ar. After a standard Taber abrasion test, the minimum change in haze value was approximately 1.3% for a sample synthesized under Ar (below the 2.0% requirement for vehicle window glass). The adhesion strength between the thin film and the substrate probably improved because of the etching effect of the primer by the Ar plasma during the deposition. The results confirmed that atmospheric remote technology can synthesize silica-based films and demonstrated that the technology is applicable to manufacturing vehicle window glass replacements.

本文言語English
論文番号040602
ジャーナルJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
39
4
DOI
出版ステータスPublished - 2021 7 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 器械工学
  • プロセス化学およびプロセス工学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学
  • 材料化学

フィンガープリント

「Improved abrasion resistance of silica-based CVD thin films on polycarbonate substrates for automotive applications」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル