In-situ measurement of molecular orientation of the pentacene ultrathin films grown on SiO2 substrates

Genki Yoshikawa, Tetsuhiko Miyadera, Ryo Onoki, Keiji Ueno, Ikuyo Nakai, Shiro Entani, Susumu Ikeda, Dong Guo, Manabu Kiguchi, Hiroshi Kondoh, Toshiaki Ohta, Koichiro Saiki

研究成果: Article査読

23 被引用数 (Scopus)

抄録

Molecular orientations of pentacene ultrathin films grown on SiO2 substrates were studied without the influence of the atmosphere by vacuum atomic force microscopy (V-AFM) and near edge X-ray absorption fine structure (NEXAFS). The experimental processes from deposition of pentacene to characterization of films were performed under vacuum condition without exposure to the atmosphere. V-AFM and NEXAFS measurements showed that pentacene molecules tend to grow on SiO2 surface with their molecular long axes perpendicular to the substrate surfaces (standing-mode) irrespective of preparation procedure of SiO2 substrate.

本文言語English
ページ(範囲)2518-2522
ページ数5
ジャーナルSurface Science
600
12
DOI
出版ステータスPublished - 2006 6 15
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜
  • 材料化学

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